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In the micro-arc oxidation process, chemical oxidation, electrochemical oxidation, and plasma oxidation exist at the same time, so the formation process of the ceramic layer is very complex, and there is no reasonable model that can fully describe the formation of the ceramic layer. The micro-arc oxidation process introduces the working area from the Faraday region of ordinary anodizing to the high-voltage discharge area, which overcomes the defects of hard anodizing and greatly improves the comprehensive performance of the film. The micro-arc oxide film layer is firmly combined with the substrate, with dense structure and high toughness, and has good wear resistance, corrosion resistance, high temperature impact resistance and electrical insulation characteristics.
This technology has the characteristics of simple operation and easy to realize the functional adjustment of the coating, and the process is not complicated
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At high temperature, by introducing an appropriate amount of oxygen, a trace amount of oxidation occurs on the surface of aluminum nitride powder, and a thin film of dense alumina is formed on its surface, thus effectively inhibiting the reaction between aluminum nitride and water.
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OK; When the temperature of aluminum nitride in the air is higher than 700, the surface of the substance will oxidize. At room temperature, oxide films 5-10 nanometers thick can still be detected on the surface of the substance. Up to 1370, oxide films can still protect the substance.
However, when the temperature is higher than 1370, a large amount of oxidation occurs.
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Yes, but it is completely difficult to react completely because the resulting alumina is very covered.
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No reaction can occur.
The first is that aluminum nitride reacts with water to form aluminum hydroxide.
and ammonia, then aluminum hydroxide with sodium hydroxide.
React. It needs to be discussed that the amount of reactants, if there is more sodium hydroxide, then the product is sodium metaaluminate. If there is more aluminum nitride, an aluminum hydroxide precipitate is generated.
However, in order with DUV light-emitting diodes.
Compatible with laser device manufacturing, a gentler and more controllable technology is necessary. In addition, defect-free selective etching techniques are required, in which case a controllable etching scheme can be applied to different material systems, regardless of dislocation density.
Metathesis reactionThe conditions under which it occurred.
1. The acid in the reactant must be soluble, and at least one substance in the product is gas or precipitate or water.
2. At least one of the reactants is soluble and modular.
3. The two salts in the reactants in the junior high school stage are soluble, and at least one of the two salts obtained by the reaction is insoluble.
4. The reactants should generally be soluble, and at least one of the products is a precipitate or gas, and only the reaction of ammonia salt with alkali can generate gas.
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1. The liveliness of metal aluminum is not high, the metallicity is not strong, and it has a certain non-metallic property.
2. Nitrogen is a very inactive gas, which can usually be regarded as an inert gas, and must be reactive at high temperatures.
3. Nitrogen and metal aluminum must be 800 to 1000 degrees Celsius to react, and aluminum must be made into aluminum powder, so that the reaction can be carried out more well.
Equation. It can only react with dilute nitric acid, not concentrated nitric acid). >>>More
Hydrogen peroxide to oxygen is not separated from the reaction. You just have to remember all redox reactions. >>>More
1) If the aldehyde does not have -H, the disproportionation reaction can occur under alkaline conditions (generally concentrated alkali). >>>More
Not all of them can react acid + alkali - salt + water, which is called neutralization reaction, which is a kind of metathesis reaction, so there must be water, gas or precipitate in the product.
Let me summarize your answers. Acidic oxides in general do not react with acids, and basic oxides do not react with alkalis. But just in general, there are many special cases, not one or two as others say, silica can react with hydrofluoric acid SiO2+4HF=SIF4+2H2O; Sulfur dioxide and sulfur trioxide can react with hydrosulfuric acid, SO2 + 2H2S = 3S + 2H2O, and the one of sulfur trioxide and hydrofluoric acid will not be written (because the product may have several conditions, which is related to the ratio of the two). >>>More